Förlagets beskrivning
This book discusses the study of simulating the growth of a thin film by chemical vapor deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models
Fler böcker av Juergen Geiser
Liknande böcker
Recensioner
Den här boken har tyvärr inte några recensioner ännu. Om du redan läst boken, skriv en recension!
Recensera boken
Skriv en recension och dela dina åsikter med andra. Försök att fokusera på bokens innehåll. Läs våra instruktioner för mer information.
Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
Bokrecensioner » Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
|
|
 |
|
|
|
|
